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Experimental Data
The damaged layer of a wafer ground using UltraPoligrind is extremely small compared to that of a wafer ground using a #2000 grinding wheel.
The amount of precipitated Cu detected on the polished surface of a mirror wafer exceeds 1.0 E11 after a copper solution was applied to the surface. In contrast, the amount of precipitated Cu detected on the backside of a wafer polished with Gettering DP is below the detection limit, thus indicating that the surface had a gettering effect.
To quantitatively measure the gettering effects, samples were contaminated with a Cu solution. The Cu was diffused at 350°C for 3 hours and then analyzed using TXRF (Total-Reflection X-ray Fluorescence). The observed Cu on the surface of the respective wafers is as seen below.
※ Detectable range at below 0.5E10 atoms/cm2
Specification:
Assistance with using Poligrind
To achieve the best processing results possible with Poligrind, correct formulation of the application is required. DISCO’s applications engineers will be happy to work with your workpiece and specifications to achieve the desired processing results
When ordering
Please contact a DISCO representative with your product needs such as type, wheel size, and quantity.
When you place the first order with us, please explain application information such as materials to grind, sizes, machine, type, and other specification.
We are ready to help you to determine which is our most appropriate product type for your application.
* Due to improvements in our products, it is possible that product specifications may be changed without advanced notice.
Please confirm the product specifications with a DISCO representative.
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